Characterization of Ti-based nanocrystalline ternary nitride films

S. M. Aouadi, J. A. Chladek, F. Namavar, N. Finnegan, S. L. Rohde

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Recently, considerable attention was devoted in using optical techniques to deduce the chemical composition of various materials. In particular, spectroscopic ellipsometry was shown to be a powerful technique in measuring the thickness and optical constants of various materials. This techniques was widely used in the semiconductor, optical and magnetic recording industries and was still at the early development stages in the decorative and protective coating industries.

Original languageEnglish (US)
Pages (from-to)1967-1973
Number of pages7
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number5
DOIs
StatePublished - Sep 1 2002

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Nitrides
nitrides
recording
industries
Optical recording
protective coatings
Optical constants
Spectroscopic ellipsometry
Magnetic recording
Protective coatings
magnetic recording
ellipsometry
Industry
chemical composition
Semiconductor materials
coatings
Chemical analysis

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Characterization of Ti-based nanocrystalline ternary nitride films. / Aouadi, S. M.; Chladek, J. A.; Namavar, F.; Finnegan, N.; Rohde, S. L.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 20, No. 5, 01.09.2002, p. 1967-1973.

Research output: Contribution to journalArticle

Aouadi, S. M. ; Chladek, J. A. ; Namavar, F. ; Finnegan, N. ; Rohde, S. L. / Characterization of Ti-based nanocrystalline ternary nitride films. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2002 ; Vol. 20, No. 5. pp. 1967-1973.
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