Characterization of CrBN films deposited by ion beam assisted deposition

S. M. Aouadi, Fereydoon Namavar, E. Tobin, N. Finnegan, R. T. Haasch, R. Nilchiani, Joseph A Turner, S. L. Rohde

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

This article reports on the growth and analysis of CrBN nanocrystalline materials using an ion beam assisted deposition process. In addition, this article addresses the utilization of spectroscopic ellipsometry for in situ analysis of ternary nitrides. Coatings, with a total thickness of 1.5±0.2μm, were deposited at low temperatures (<200°C) on silicon substrates using ion beam assisted deposition. These coatings were characterized postdeposition using x-ray diffraction (XRD), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), visible-light spectroscopic ellipsometry (VIS-SE), infrared spectroscopic ellipsometry (IR-SE), and nanoindentation. The primary phases in the films were investigated using XRD. The surface morphology and nanocrystalline nature of the coatings (grain size of 5-7 nm) were deduced using AFM. The elemental composition and phase composition of the samples were determined from XPS and AES measurements and were subsequently deduced from the analysis of the VIS-SE data, and these correlated well. XPS, AES, and IR-SE revealed the crystal structure of the BN phase in the ternary compounds. The correlation of the results from these various techniques indicates that in situ SE may be a potential technique to control the growth of ternary nitride coatings in the future. The mechanical properties of the coatings were evaluated using nanohardness testing. The hardness and elastic modulus were measured to be 19-22 GPa and 250-270 GPa, respectively.

Original languageEnglish (US)
Pages (from-to)1040-1045
Number of pages6
JournalJournal of Applied Physics
Volume91
Issue number3
DOIs
StatePublished - Feb 1 2002

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ellipsometry
ion beams
coatings
x ray spectroscopy
Auger spectroscopy
electron spectroscopy
photoelectron spectroscopy
nitrides
x ray diffraction
atomic force microscopy
nanoindentation
modulus of elasticity
nanocrystals
hardness
grain size
mechanical properties
crystal structure
silicon

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Aouadi, S. M., Namavar, F., Tobin, E., Finnegan, N., Haasch, R. T., Nilchiani, R., ... Rohde, S. L. (2002). Characterization of CrBN films deposited by ion beam assisted deposition. Journal of Applied Physics, 91(3), 1040-1045. https://doi.org/10.1063/1.1426243

Characterization of CrBN films deposited by ion beam assisted deposition. / Aouadi, S. M.; Namavar, Fereydoon; Tobin, E.; Finnegan, N.; Haasch, R. T.; Nilchiani, R.; Turner, Joseph A; Rohde, S. L.

In: Journal of Applied Physics, Vol. 91, No. 3, 01.02.2002, p. 1040-1045.

Research output: Contribution to journalArticle

Aouadi, SM, Namavar, F, Tobin, E, Finnegan, N, Haasch, RT, Nilchiani, R, Turner, JA & Rohde, SL 2002, 'Characterization of CrBN films deposited by ion beam assisted deposition', Journal of Applied Physics, vol. 91, no. 3, pp. 1040-1045. https://doi.org/10.1063/1.1426243
Aouadi SM, Namavar F, Tobin E, Finnegan N, Haasch RT, Nilchiani R et al. Characterization of CrBN films deposited by ion beam assisted deposition. Journal of Applied Physics. 2002 Feb 1;91(3):1040-1045. https://doi.org/10.1063/1.1426243
Aouadi, S. M. ; Namavar, Fereydoon ; Tobin, E. ; Finnegan, N. ; Haasch, R. T. ; Nilchiani, R. ; Turner, Joseph A ; Rohde, S. L. / Characterization of CrBN films deposited by ion beam assisted deposition. In: Journal of Applied Physics. 2002 ; Vol. 91, No. 3. pp. 1040-1045.
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