Characteristics of excimer laser induced plasma from an aluminum target by spectroscopic study

Yong Feng Lu, Zi Bo Tao, Min Hui Hong

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48 Citations (Scopus)

Abstract

Optical emission spectrum of Al plasma induced by a KrF excimer laser (248 nm) in a vacuum chamber is investigated using an optical multichannel analyzer (OMA). It is observed that different air pressures and delay times after the laser pulse play important roles in the characterization of emission spectrum from Al surface. The optimal conditions for spectroscopic study of Al plasma are estimated. A spectrum self-absorption effect can be observed clearly from the calibrated spectral line profiles at the initial stage of plasma expansion and high fluence. Assuming local thermodynamic equilibrium (LTE) conditions, the plasma temperature and density are estimated from two spectral lines (Al I, 309.2 and 396.1 nm) as a function of air pressure, delay time and laser fluence. The plasma temperature is derived to be in the range of 5500 to 10000 K using the relative intensities of the spectral lines. The electron density is estimated from Stark broadening profiles of the spectral lines, and found to range from 0.7 × 1018 to 3.5 × 1018 cm-3. The behaviors of the plasma temperature and density reveal a I-D plasma expansion at a delay time shorter than 200 ns and the plasma shielding effect at high fluence.

Original languageEnglish (US)
Pages (from-to)2958-2963
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume38
Issue number5 A
StatePublished - Dec 1 1999

Fingerprint

Excimer lasers
excimer lasers
line spectra
aluminum
Aluminum
Plasmas
plasma temperature
fluence
time lag
plasma density
emission spectra
Time delay
expansion
self absorption
air
local thermodynamic equilibrium
vacuum chambers
profiles
lasers
light emission

Keywords

  • Al substrate
  • Laser ablation
  • Plasma diagnosis
  • Spectroscopy

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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title = "Characteristics of excimer laser induced plasma from an aluminum target by spectroscopic study",
abstract = "Optical emission spectrum of Al plasma induced by a KrF excimer laser (248 nm) in a vacuum chamber is investigated using an optical multichannel analyzer (OMA). It is observed that different air pressures and delay times after the laser pulse play important roles in the characterization of emission spectrum from Al surface. The optimal conditions for spectroscopic study of Al plasma are estimated. A spectrum self-absorption effect can be observed clearly from the calibrated spectral line profiles at the initial stage of plasma expansion and high fluence. Assuming local thermodynamic equilibrium (LTE) conditions, the plasma temperature and density are estimated from two spectral lines (Al I, 309.2 and 396.1 nm) as a function of air pressure, delay time and laser fluence. The plasma temperature is derived to be in the range of 5500 to 10000 K using the relative intensities of the spectral lines. The electron density is estimated from Stark broadening profiles of the spectral lines, and found to range from 0.7 × 1018 to 3.5 × 1018 cm-3. The behaviors of the plasma temperature and density reveal a I-D plasma expansion at a delay time shorter than 200 ns and the plasma shielding effect at high fluence.",
keywords = "Al substrate, Laser ablation, Plasma diagnosis, Spectroscopy",
author = "Lu, {Yong Feng} and Tao, {Zi Bo} and Hong, {Min Hui}",
year = "1999",
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T1 - Characteristics of excimer laser induced plasma from an aluminum target by spectroscopic study

AU - Lu, Yong Feng

AU - Tao, Zi Bo

AU - Hong, Min Hui

PY - 1999/12/1

Y1 - 1999/12/1

N2 - Optical emission spectrum of Al plasma induced by a KrF excimer laser (248 nm) in a vacuum chamber is investigated using an optical multichannel analyzer (OMA). It is observed that different air pressures and delay times after the laser pulse play important roles in the characterization of emission spectrum from Al surface. The optimal conditions for spectroscopic study of Al plasma are estimated. A spectrum self-absorption effect can be observed clearly from the calibrated spectral line profiles at the initial stage of plasma expansion and high fluence. Assuming local thermodynamic equilibrium (LTE) conditions, the plasma temperature and density are estimated from two spectral lines (Al I, 309.2 and 396.1 nm) as a function of air pressure, delay time and laser fluence. The plasma temperature is derived to be in the range of 5500 to 10000 K using the relative intensities of the spectral lines. The electron density is estimated from Stark broadening profiles of the spectral lines, and found to range from 0.7 × 1018 to 3.5 × 1018 cm-3. The behaviors of the plasma temperature and density reveal a I-D plasma expansion at a delay time shorter than 200 ns and the plasma shielding effect at high fluence.

AB - Optical emission spectrum of Al plasma induced by a KrF excimer laser (248 nm) in a vacuum chamber is investigated using an optical multichannel analyzer (OMA). It is observed that different air pressures and delay times after the laser pulse play important roles in the characterization of emission spectrum from Al surface. The optimal conditions for spectroscopic study of Al plasma are estimated. A spectrum self-absorption effect can be observed clearly from the calibrated spectral line profiles at the initial stage of plasma expansion and high fluence. Assuming local thermodynamic equilibrium (LTE) conditions, the plasma temperature and density are estimated from two spectral lines (Al I, 309.2 and 396.1 nm) as a function of air pressure, delay time and laser fluence. The plasma temperature is derived to be in the range of 5500 to 10000 K using the relative intensities of the spectral lines. The electron density is estimated from Stark broadening profiles of the spectral lines, and found to range from 0.7 × 1018 to 3.5 × 1018 cm-3. The behaviors of the plasma temperature and density reveal a I-D plasma expansion at a delay time shorter than 200 ns and the plasma shielding effect at high fluence.

KW - Al substrate

KW - Laser ablation

KW - Plasma diagnosis

KW - Spectroscopy

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