Analytic solutions for optimized ellipsometric measurements of interfaces and surface layers in thin film structures

Samuel A. Alterovitz, George H. Bu-Abbud, John A Woollam

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

The maximum experimental sensitivity in ellipsometric measurements for samples that include a composite (two-layer) film on a substrate is treated with mathematical generality. A detailed theoretical computation is made for a system consisting of a moderately thick film on a substrate and including either an interface layer between the film and substrate or a thin surface layer on top of the moderately thick film. Analytical conditions for the sensitivity of p or s wave suppression are determined. For the air/SiO2/Si system a numerical calculation is performed to determine the optimum sensitivity for interfacial layer studies.

Original languageEnglish (US)
Pages (from-to)183-196
Number of pages14
JournalThin Solid Films
Volume123
Issue number3
DOIs
StatePublished - Jan 18 1985

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surface layers
Thick films
Thin films
thick films
Substrates
thin films
sensitivity
retarding
composite materials
air
Composite materials
Air

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Analytic solutions for optimized ellipsometric measurements of interfaces and surface layers in thin film structures. / Alterovitz, Samuel A.; Bu-Abbud, George H.; Woollam, John A.

In: Thin Solid Films, Vol. 123, No. 3, 18.01.1985, p. 183-196.

Research output: Contribution to journalArticle

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