A new mechanism of laser dry cleaning

B. S. Luk'yanchuk, Y. W. Zheng, Y. F. Lu

Research output: Contribution to journalConference article

3 Scopus citations

Abstract

The dry laser cleaning arises due to thermal expansion of the substrate and/or particle, when the corresponding acceleration (breaking) force produces work sufficient to overcome the adhesion energy. The previous examinations of the dry cleaning were done for two mechanisms: 1) expansion of absorbing particle on the transparent substrate and 2) expansion (thermal deformation) of the absorbing substrate with non-absorbing particle. Nevertheless using model with conventional mechanism based on the 1D surface expansion, one can find (for the smooth laser pulse) threshold fluence by the order of magnitude higher than experimental one. In the present paper, we discuss the new mechanism for situation when the particle is heated due to thermal contact with substrate, and additional thermodeformation effect, caused by optical enhancement. It is shown that these effects can be responsible for relatively small threshold fluence for laser cleaning of SiO2 particles (with size 0.5-1.0 μm) from the surface of Si by ns-excimer laser pulse.

Original languageEnglish (US)
Pages (from-to)115-126
Number of pages12
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4423
DOIs
Publication statusPublished - Dec 1 2000
EventNonreasonant Laser-Matter Interaction (NLMI-10) - St.Petersburg-Pushkin, Russian Federation
Duration: Aug 21 2001Aug 23 2001

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Keywords

  • Dry cleaning
  • Laser cleaning
  • Modelling

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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