A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface

Yong Feng Lu, Wen Dong Song, Kai Dong Ye, Yuan Ping Lee, Daniel S.H. Chan, Teck Seng Low

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Taking Van der Waals force and cleaning force due to fast thermal expansion of substrate surface induced by pulsed laser irradiation into account, a cleaning model was established for removal of tiny particles from substrate surfaces. The cleaning condition and cleaning threshold can be obtained from this model. Theoretical predictions have been verified by the experimental results for removing quartz particles from silicon substrate. For laser-induced removal of quartz particles from silicon substrate surfaces, the cleaning threshold is about 135 mJ/cm2. Cleaning efficiency increases with increasing laser fluence, and large particles can be removed more easily than small ones.

Original languageEnglish (US)
Pages (from-to)L1304-L1306
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume36
Issue number10 PART A
StatePublished - Oct 1 1997

Fingerprint

cleaning
Thermal expansion
thermal expansion
Cleaning
Lasers
Substrates
lasers
Quartz
quartz
Silicon
Van der Waals forces
thresholds
silicon
Laser beam effects
Pulsed lasers
pulsed lasers
fluence
irradiation
predictions

Keywords

  • Adhesion force
  • Cleaning force
  • Cleaning model
  • Cleaning threshold
  • Laser cleaning
  • Particle removal
  • Quartz particle
  • Silicon substrate

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface. / Lu, Yong Feng; Song, Wen Dong; Ye, Kai Dong; Lee, Yuan Ping; Chan, Daniel S.H.; Low, Teck Seng.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 36, No. 10 PART A, 01.10.1997, p. L1304-L1306.

Research output: Contribution to journalArticle

Lu, Yong Feng ; Song, Wen Dong ; Ye, Kai Dong ; Lee, Yuan Ping ; Chan, Daniel S.H. ; Low, Teck Seng. / A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface. In: Japanese Journal of Applied Physics, Part 2: Letters. 1997 ; Vol. 36, No. 10 PART A. pp. L1304-L1306.
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